A position sensing detector for extreme ultraviolet radiation

Purpose and goal: ** Denna text är maskinöversatt **

As the wavelength 13.5 nm (EUV) is becoming more common in photolithography processes, it is important for SiTek that its products are able to perform at this wavelength as well. 13.5 nm in various designs of position sensing detectors. The tests carried out at the SPECIES beamline at MAX IV gave clear indications of which detector designs had the greatest potential to perform well at the 13.5 nm wavelength

Expected results and effects: ** Denna text är maskinöversatt **

The result of the project is that the measurements carried out at MAX IV showed clear differences between the different designs of the detectors regarding performance. The adjustments made to the detectors between the first and second rounds at MAX IV produced clear improvements in several categories.

The company now has two designs of detectors that showed promising performance in tests. The plan is to, together with potential end customers of the detectors in industry, carry out the development required to reach a finished product. Approach and implementation: ** Denna text är maskinöversatt **

With the help of simulations carried out by researchers at the Department of Electronic Design (EKS) at Mittuniversitetet, several different designs of detectors could be developed and then manufactured by SiTek. Measurements and tests at MAX IV in Lund then enabled experimental evaluation of the performance of the various detectors. Thanks to the fact that measurements at MAX IV were made in two rounds, lessons could be learned from the first round and implemented in the manufacture of a new round of detectors that were tested in the second round.