Industrial plasma diagnostics for digitalized thin film growth (SmartPlasma)

Purpose and goal:

The project, in the context of the Vinnova-funded competence centrum FunMat-II, has developed systems and instrumentation to enable real-time quantification and control of ionized species used in thin film deposition within ionized physical vapor deposition and more specifically within high-power impulse magnetron sputtering (HiPIMS), which is a key technology within FunMat-II. The work has resulted in a new product prototype for Ionautics called the IonMeter, where a first unit has been successfully tested.

Expected results and effects:

The project has resulted in two new product prototypes: 1) a diagnostic module that enables in-situ plasma diagnostics measurement in coating systems with focus on deposition rate and ionized flux fraction, and 2) a new model of the company’s HiPSTER HiPIMS plasma generator with new communication interfaces to allow for external (‘smart’) process control using diagnostic input. A scientific publication will also be submitted together with Linköping University.

Approach and implementation:

The project was divided into three WPs aimed at increasing the maturity of Ionautics´ concept of integrated in-situ diagnostics and HiPIMS plasma generators. The work consisted of: 1) industrial plasma diagnostics for automatic process control and 2) plasma generators that can communicate with and be controlled by external diagnostic sources, as well as 3) application of the hardware in relevant HiPIMS coating processes. We find that this strategy served us well.